Photosensitive resin precursor composition

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

Reexamination Certificate

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C430S192000, C430S193000, C430S270100, C430S907000

Reexamination Certificate

active

06887643

ABSTRACT:
A photosensitive resin precursor composition exhibiting an excellent film thickness uniformity contains: a heat resistant resin precursor polymer; a radiation sensitive compound; and a solvent expressed by formula (1):R1represents an alkyl group having a carbon number in the range of 1 to 3. R2, R3, R4, and R5each represent hydrogen or an alkyl group having a carbon number in the range of 1 to 3, and l represents an integer in the range of 0 to 3.

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patent: 1 209 523 (2002-05-01), None
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patent: 2002 055 837 (2002-07-01), None

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