Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...
Reexamination Certificate
2006-03-31
2009-10-20
Eashoo, Mark (Department: 1796)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Compositions to be polymerized by wave energy wherein said...
C522S134000, C522S136000, C522S139000, C522S140000, C522S150000, C522S152000, C522S153000, C522S174000, C522S175000, C522S176000, C522S177000, C522S178000, C532S001000, C552S001000, C552S006000, C552S007000, C552S008000
Reexamination Certificate
active
07605191
ABSTRACT:
The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the photosensitive composition.The photosensitive resin is represented by the following formula (1):(wherein n represents a mean polymerization degree and is 5 or more; R1and R2, which may be identical to or different from each other, each represent an alkylene group, an arylene group, an oxyalkylene group, or a single bond; each of X and Y represents a photosensitive unit represented by the following formula (2):or either one of X and Y represents a photosensitive unit represented by the above formula (2) and the other represents an amino group; R3represents a group selected from among the groups represented by the following formula set (3):R4represents a group selected from among the groups represented by the following formula set (4):at least one of R3and R4has at least one azido group; and R5represents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom).
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Ikeya Takeshi
Miyazaki Kana
Shibuya Toru
Eashoo Mark
Paul Jessica
Toyo Gosei Co., Ltd.
Young & Thompson
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