Photosensitive resin film and use thereof

Radiation imagery chemistry: process – composition – or product th – Visible imaging including step of firing or sintering

Patent

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Details

430325, 430330, G03C 1106, G03C 556

Patent

active

060664312

ABSTRACT:
There are provided a photosensitive resin film which can eliminate the step of development and the like, that is, can simplify the process, and in addition can form an even fluorescent substance layer in intimate contact with the surface of cells, and a back plate for PDP using the film. The photosensitive resin film comprises a substrate film and a pressure-sensitive adhesive, photosensitive resin layer provided on one side of the film, wherein the photosensitive resin layer comprises a photosensitive resin that contains a fluorescent substance and, upon exposure, causes the tackiness of exposed areas to be lowered.

REFERENCES:
patent: 4183990 (1980-01-01), Uchida et al.

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