Photosensitive resin comprising a polymer having an azide group

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

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525390, 525392, 430167, 430195, 430197, 552 8, C08F26500

Patent

active

054243688

ABSTRACT:
A photosensitive resin having at least one group as shown below in Chemical Formula (1) in a molecule. ##STR1## wherein n represents an integer from 1 to 10. Since the photosensitive resin has an azido group in a molecule having an adsorption region higher than 300 nm, the resin is highly sensitive. Therefore, an emulsion coating photo mask or a soda glass photo mask, which allows light permeation within the abosorption region of the azido group and is cheap in industry, can be used as the photo mask for the photosensitive resin of the invention. The photosensitive resin is particularly useful as a photo resist.

REFERENCES:
patent: 4074008 (1978-02-01), Green
patent: 4229514 (1980-10-01), Kurita et al.
patent: 5024920 (1991-06-01), Morishita et al.
patent: 5254431 (1993-10-01), Etherington et al.

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