Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2006-09-05
2006-09-05
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S018000, C430S191000, C430S192000, C430S193000, C430S326000, C528S335000, C528S338000, C528S339000, C528S340000, C528S347000, C528S348000
Reexamination Certificate
active
07101652
ABSTRACT:
New photosensitive PBO precursor polymers which contain diazoquinone moieties attached to its backbone and in which all amino end groups are converted into amide groups. The photosensitive formulation based on the disclosed PBO precursor polymers have good imaging and mechanical properties as well as superior shelf life stability.Photosensitive polybenzoxazole precursor polymers having (sulfon)amide end groups (with or without attached diazoquinone groups) can be formulated into photosensitive compositions with diazoquinone photoactive compounds which lack benzylic hydrogens on the backbone to yield compositions producing films significantly lighter in color after curing.
REFERENCES:
patent: 4371685 (1983-02-01), Ahne et al.
patent: 4395482 (1983-07-01), Ahne et al.
patent: 4622285 (1986-11-01), Ahne et al.
patent: 5037720 (1991-08-01), Khanna
patent: 5096999 (1992-03-01), Hellmut et al.
patent: 5376499 (1994-12-01), Hammerschmidt et al.
patent: 5449584 (1995-09-01), Banba et al.
patent: 5726279 (1998-03-01), Sezi et al.
patent: 5783654 (1998-07-01), Sezi et al.
patent: 5883221 (1999-03-01), Sezi et al.
patent: 5922825 (1999-07-01), Sezi et al.
patent: 5973202 (1999-10-01), Sezi et al.
patent: 6071666 (2000-06-01), Hirano et al.
patent: 6120970 (2000-09-01), Sezi et al.
patent: 6127086 (2000-10-01), Waterson et al.
patent: 6153350 (2000-11-01), Sezi et al.
patent: 6177225 (2001-01-01), Weber et al.
patent: 6376151 (2002-04-01), Takahashi et al.
patent: 6607865 (2003-08-01), Makabe et al.
patent: 2004/0229167 (2004-11-01), Naiini et al.
patent: 11-109620 (1999-04-01), None
patent: 11-109635 (1999-04-01), None
patent: 11-258795 (1999-09-01), None
patent: 2000-302863 (2000-10-01), None
patent: 2001-100416 (2001-04-01), None
patent: 2002-020484 (2002-01-01), None
patent: 2002-053664 (2002-02-01), None
Jan Rabek, Experimental Methods in Polymer Chemistry, John Wiley & Sons, New York, 1983. (This reference is a book).
Hopla Richard
Naiini Ahmad A.
Racicot Donald
Rushkin Il'ya
Arch Specialty Chemicals, Inc.
Chu John S.
Ohlandt Greeley Ruggiero & Perle LLP
LandOfFree
Photosensitive resin compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive resin compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive resin compositions will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3545981