Photosensitive resin compositions

Details Photosensitive resin compositions Photosensitive resin compositions

2005-08-16

2005-08-16

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

C430S191000, C430S270100, C430S325000, C430S330000, C430S906000

Reexamination Certificate

active

06929891

ABSTRACT:
A heat resistant negative working photosensitive composition that comprises(a) one or more polybenzoxazole precursor polymers (I):wherein x is an integer from about 10 to about 1000, y is an integer from 0 to about 900 and (x+y) is about less then 1000; Ar1is selected from the group consisting of a tetravalent aromatic group, a tetravalent heterocyclic group, or mixtures thereof; Ar2is selected from the group consisting a divalent aromatic, a divalent heterocyclic, a divalent alicyclic, a divalent aliphatic group that may contain silicon, or mixtures thereof; Ar3is selected from the group consisting a divalent aromatic group, a divalent aliphatic group, a divalent heterocyclic group, or mixtures thereof; Ar4is selected from the group consisting Ar1(OH)2or Ar2; G is an organic group selected from the group consisting groups having a carbonyl, carbonyloxy or sulfonyl group attached directly to the terminal NH group of the polymer;(b) one or more photo-active compounds which release acid upon irradiation (PAGs);(c) a latent crosslinker which contains at least two ˜N—(CH2OR)nunits wherein n=1 or 2 and R is a linear or branched C1-C8alkyl group, with the proviso that when a glycoluril is employed as the latent crosslinker, the G group in the polybenzoxazole precursor polymer is produced from the reaction of a cyclic anhydride; and(d) at least one solvent that is not NMP.

REFERENCES:
patent: 3957512 (1976-05-01), Kleeberg et al.
patent: 4040831 (1977-08-01), Rubner et al.
patent: 4339521 (1982-07-01), Ahne et al.
patent: 4540598 (1985-09-01), Berner et al.
patent: 4548891 (1985-10-01), Riediker et al.
patent: 4703103 (1987-10-01), Wolfe et al.
patent: 5233014 (1993-08-01), Gregory et al.
patent: 5376499 (1994-12-01), Hammerschmidt et al.
patent: 5449584 (1995-09-01), Banba et al.
patent: 5486447 (1996-01-01), Hammerschmidt et al.
patent: 5512422 (1996-04-01), Hanawa et al.
patent: 5726279 (1998-03-01), Sezi et al.
patent: 5760162 (1998-06-01), Sezi et al.
patent: 5783654 (1998-07-01), Sezi et al.
patent: 5807969 (1998-09-01), Sezi et al.
patent: 5856065 (1999-01-01), Hagen
patent: 5922825 (1999-07-01), Sezi et al.
patent: 5973202 (1999-10-01), Sezi et al.
patent: 6010825 (2000-01-01), Hagen et al.
patent: 6127086 (2000-10-01), Waterson et al.
patent: 6177225 (2001-01-01), Weber et al.
patent: 6183934 (2001-02-01), Kawamonzen
patent: 6214516 (2001-04-01), Waterson et al.
patent: 6277546 (2001-08-01), Breyta
patent: 6376151 (2002-04-01), Takahashi et al.
patent: 6436593 (2002-08-01), Minegishi et al.
patent: 6485886 (2002-11-01), Yamato et al.
patent: 2004/0023147 (2004-02-01), Hirano et al.
patent: A 0624826 (1997-07-01), None
patent: 11-153866 (1999-06-01), None
patent: 2001125267 (2001-05-01), None
Hinsberg et al., “Influence of Polymer Properties On Airborne Chemical Contamination of Chemically Amplified Resists”, SPIE, vol. 1925, pp. 43-52, 1993.
Jan Rabek, Experimental Methods in Polymer Chemistry, John Wiley & Sons, New York, 1983. (This reference is a book).
Asakura et al., “Novel Photoacid Generators For Chemically Amplified Resist With G-Line, I-Line and DUV Exposure”, Proceedings of SPIE, vol. 4345 pp. 484-492., 2001.

Affiliated with

Also associated with

Rating

Photosensitive resin compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive resin compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive resin compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3519995