Photosensitive resin compositions

Details Photosensitive resin compositions Photosensitive resin compositions

2005-02-18

2008-08-26

Chu, John S. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

C430S191000, C430S192000, C430S193000, C430S326000, C430S330000

Reexamination Certificate

active

07416830

ABSTRACT:
A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate.

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