Photosensitive resin compositions

Details Photosensitive resin compositions Photosensitive resin compositions

2007-03-27

2007-03-27

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

C430S190000, C430S191000, C430S192000, C430S193000, C430S326000, C430S330000

Reexamination Certificate

active

10793341

ABSTRACT:
A positive photosensitive resin composition comprising:(a) at least one polybenzoxazole precursor polymer having structure I or II;(b) at least one photosensitive compound selected from compounds described by structures III–V,(c) at least one solvent; and(d) optionally an adhesion promoter.

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