Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1999-09-24
2000-10-03
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430192, 430193, 430326, G03F 7023, G03F 730
Patent
active
061270865
ABSTRACT:
A positive photosensitive resin composition comprising (a) a silane diol such as diarylsilane diol or dialkylsilane diol, (b) one or more capped polybenzoxazole precursors having the structure: ##STR1## wherein Ar.sub.1 is a tetravalent aromatic group, aliphatic group, heterocyclic group, or mixtures thereof; Ar.sub.2 is a divalent aromatic, heterocyclic, alicyclic, or aliphatic group that optionally may contain silicon; Ar.sub.3 is divalent aromatic group, aliphatic group, heterocyclic group, or mixtures thereof;
REFERENCES:
patent: 4395482 (1983-07-01), Ahne et al.
patent: 5037720 (1991-08-01), Khanna
patent: 5449584 (1995-09-01), Banba et al.
Hsu Steve Lien-Chung
Naiini Ahmad
Waterson Pamela J.
Weber William D.
Arch Specialty Chemicals, Inc.
Chu John S.
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