Photosensitive resin composition with o-quinone diazide and novo

Details Photosensitive resin composition with o-quinone diazide and novo Photosensitive resin composition with o-quinone diazide and novo

1988-11-25

1991-01-29

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430175, 430176, 430191, 430193, 430325, 430326, G03F 7023, G03C 160

Patent

active

049886010

ABSTRACT:
A photosensitive resin composition having high heat resistance, sensitivity, and resolution performance, including a novolak resin prepared by condensing 2,5-xylenol with m-cresol and/or p-cresol using a carbonyl compound, a novolak resin prepared by condensing 3,5-xylenol with m-cresol and/or p-cresol, and a photosensitive reagent. In addition, four other types of photosensitive resin compositions are disclosed.

REFERENCES:
patent: 4551409 (1985-11-01), Gulla et al.
patent: 4719167 (1988-01-01), Miura et al.
patent: 4731319 (1988-03-01), Kohara et al.
English Translation of Japanese Patent Publication #60-164,740, published 8/27/1985 (Hosaka et al.).

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