Photosensitive resin composition, thin film panel made with...

Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer

Reexamination Certificate

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C430S191000, C430S192000, C430S193000, C430S311000, C430S313000, C430S326000, C430S330000

Reexamination Certificate

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07338737

ABSTRACT:
A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The solvent includes a diethylene glycol dialkyl ether that includes an alkyl group including one to five carbon atoms, an ethyl 3-ethoxy propionate, an alkyl acetate that includes an alkyl group including three to eight carbon atoms, and an alkyl lactate that includes an alkyl group including one to six carbon atoms. The composition may be used to make high-quality display panels with uniformly-coated insulating layers.

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patent: 6787286 (2004-09-01), Szmanda et al.
patent: 6797453 (2004-09-01), Shiraki et al.
patent: 6905809 (2005-06-01), Eilbeck
patent: 2000-080124 (2000-03-01), None
patent: 2002-055450 (2002-02-01), None
patent: 2004-126509 (2004-04-01), None
patent: 1020010045129 (2001-06-01), None
patent: 1020030033786 (2003-05-01), None
patent: 1020030051129 (2003-06-01), None

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