Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer
Reexamination Certificate
2007-11-20
2007-11-20
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaged product
Including resin or synthetic polymer
C430S191000, C430S192000, C430S193000, C430S280100, C430S317000, C430S318000, C430S319000, C430S320000, C438S151000
Reexamination Certificate
active
11318157
ABSTRACT:
A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The surfactant includes an organic fluorine compound having the structurea first silicone compound having the structurea second silicone compound having the structureThe resin composition may be used in display panels.
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Kim Kyu-Young
Lee Hi-Kuk
Yuko Yako
Chu John S.
MacPherson Kwok & Chen & Heid LLP
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