Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer
Reexamination Certificate
2005-03-15
2005-03-15
Walke, Amanda (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaged product
Including resin or synthetic polymer
C430S270100, C430S326000, C430S296000, C430S966000, C430S967000
Reexamination Certificate
active
06866973
ABSTRACT:
There are provided a photosensitive resin composition containing at least a polymer compound having a sugar structure, which has at least two species of functional groups cleavable in the presence of an acid, and a photo acid generator generating an acid by radiation of an electromagnetic wave or a beam of an electrically charged particle, and in addition, a resist composition, a method for fabricating a patterned substrate for fabricating a semiconductor device and the like, and a device such as a highly integrated semiconductor and the like.
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English language machine translation of JP 06-342212.*
Patent Abstracts of Japan, vol. 1995, No. 3 (4/95) for JP6-342,212.
Database WPI, Section Ch, Week 199611, Derwent Publications, AN 1996-101274, XP002194982 (JP8-6252) 1/96.
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Walke Amanda
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