Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...
Reexamination Certificate
2001-12-02
2004-08-10
Hamilton, Cynthia (Department: 1752)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Mixing of two or more solid polymers; mixing of solid...
C430S285100, C430S287100, C526S318420
Reexamination Certificate
active
06774192
ABSTRACT:
BACKGROUND OF THE INVENTION
A. Technical Field
The present invention relates to: a useful photosensitive resin composition as a photoresist material in uses, such as color filter members, producing semiconductor circuit elements, photomasks in photolithography processes, minutely processing metals (for example, producing printed-wiring circuit boards), and protecting layers for various electronic elements (for example, intercalation insulated membranes); its use; and a production process for a lactone-ring-containing polymer included in the photosensitive resin composition; and a novel polymer that is particularly favorable as the lactone-ring-containing polymer. More particularly, the photosensitive resin composition can favorably be used as various members in color filters used for such as color liquid-crystal displays, color scanners, and video cameras, and can be applied to displays with liquid-crystal system or system using organic EL.
B. Background Art
As to photosensitive resin compositions used for a color filter, for example, JP-A-152449/1989 proposes a photosensitive resin composition for a color filter, which comprises a (meth)acrylate ester binder resin, a pigment, a dispersant, a photopolymerization initiator, and a photopolymerizable monomer. However, the heat resistance and heat stability were low in this technique. Therefore, there were problems such that: the deterioration and decomposition are caused in a subsequent heat treatment step; and the surface contamination, the decrease of evenness of coating films, the decrease of film thickness, and the coloring are caused. In addition, satisfactory properties as to coating film strength and sensitivity of exposure were also not obtained sufficiently.
In addition, JP-A-174464/1999 discloses the technique that involves taking advantage of photolithography to produce pillar spacers for displays from a photosensitive resin which is obtained by: allowing glycidyl (meth)acrylate to react with a portion of carboxyl groups of a (meth)acrylate ester polymer having the carboxyl groups; and introducing a (meth)acryloyl group. However, this technique improved the sensitivity of exposure, but the heat resistance and the coating film strength could not be said satisfactory.
In addition, JP-A-27665/1994 proposes a photosensitive resin composition for a dry film resist, which comprises: a copolymer obtained from a (meth)acrylate ester, (meth)acrylic acid, and a 2-(hydroxymethyl)acrylate ester; a photopolymerization initiator; and an ethylenically unsaturated compound. However, the development was insufficient in this technique, and the sensitivity of exposure and the coating film strength were not satisfactory, and the composition was not satisfactory as a photosensitive resin composition for a color filter.
SUMMARY OF THE INVENTION
A. Object of the Invention
Accordingly, an object of the present invention is to provide: a photosensitive resin composition, which can form uniform coating films having higher coating film strength without causing surface contamination, decrease of evenness of coating films, decrease of film thickness, and coloring by decomposition in heat treatment of subsequent steps, and has good sensitivity of exposure; use of the photosensitive resin composition; a production process for a lactone-ring-containing polymer included in the photosensitive resin composition; and a novel polymer that is particularly favorable as the lactone-ring-containing polymer.
B. Disclosure of the Invention
A photosensitive resin composition, according to the present invention, comprises a lactone-ring-containing polymer (A) as an essential component, wherein the lactone-ring-containing polymer (A) is obtained from comonomers including a 2-(hydroxyalkyl)acrylate ester and an acidic-group-containing monomer.
A color filter, according to the present invention, comprises a substrate and a resin layer, wherein the resin layer is arranged on the substrate and is formed by photocuring the photosensitive resin composition, wherein photosensitive resin composition further comprises a radically polymerizable compound and/or a photopolymerization initiator, and may further comprise a colorant and/or a dispersant.
A display, according to the present invention, comprises the color filter.
A production process for a lactone-ring-containing polymer having a lactone ring structure formed by lactonization of a structural unit derived from a 2-(hydroxyalkyl)acrylate ester, according to the present invention, comprises the step of carrying out polymerization of comonomers at 50 to 150° C., wherein the comonomers include an acidic-group-containing monomer together with the 2-(hydroxyalkyl)acrylate ester as essential monomer components.
A lactone-ring-containing polymer, according to the present invention, is obtained from comonomers including a 2-(hydroxyalkyl)acrylate ester and an acidic-group-containing monomer, and has a side chain including a radically polymerizable double bond.
These and other objects and the advantages of the present invention will be more fully apparent from the following detailed disclosure.
REFERENCES:
patent: 4691045 (1987-09-01), Fukuchi et al.
patent: 2001/0049073 (2001-12-01), Hada et al.
patent: 1 008 606 (2000-06-01), None
patent: 1-152449 (1989-06-01), None
patent: 6-27665 (1994-02-01), None
patent: 9-241323 (1997-09-01), None
patent: 10-324714 (1998-12-01), None
patent: 11-174464 (1999-07-01), None
patent: 11-50001 (1999-11-01), None
patent: 2000-206694 (2000-07-01), None
130:82044 CA, Chemical Abstracts, ACS, copyright 2003, English abstract of JP 10-224714-A2, Nagawa et al, one page.*
Derwent-ACC-No: 1999-090100, copyright 1999 Derwent Information LTD, 2 pages, English abstract of JP 10-324714A to Nippon Shokubai Co Ltd.*
Pat-No: JP410324714A, copyright 1998, JPO, one page, English abstract of JP 10-321714 A to Nakagawa et al.*
Publication No. 2000-206694, 1998, JPO, one page, English abstract of JP 2000-206694 A to Hideo et al. and Attached Machine translation generated for this patent from Searching PAJ on Japan Patent Office web site www.ipdl.jpo.go.jp.*
Publication No. 11-050001, 1998, JPO, one page, English abstract of JP 11-50001 A to Takehiko et al and Attached Machine translation generated for this patent from Searching PAJ on Japan Office web sicte www.ipdl.jpo.go.jp.*
Hada et al, “Chemically Amplified Negative-Tone Resist Using Novel Acryl Polymer for 193nm Lithography,” in Microlithograph 1999: Advances in Resist Technology and Processing XVI, Will conely, Editor, Proceedings of SPIE vol. 3678, pp. 676-683.*
Publication No. 10-324714A, 1998, JPO, one page, English abstract of JP 10-321714 A to Nakagawa et al. and Attached Machine translation of Jp 10-321714 generated for this patent from Searching PAJ on Japan Patent Office web site www.ipdl.jpo.go.jp.*
130:82044 CA, Chemical Abstracts, ACS, copyright 2003, English abstract of JP 10-224714-A2, Nagawa et al, one page.*
Derwent-ACC-No: 1999-090100, copyright 1999 Derwent Information LTD, 2 pages, English abstract of JP 10-324714A to Nippon Shokubai Co LTD.*
Pat-No: JP410324714A, copyright 1998, JPO, one page, English abstract of JP 10-321714 A to Nakagawa et al.
Asano Hideo
Kaneko Tomomasa
Kataoka Shingo
Ueda Ken-ichi
Yamaguchi Minoru
Hamilton Cynthia
Haugen Law Firm PLLP
Nippon Shokubai Co. , Ltd.
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