Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-06-04
1993-11-23
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430193, 430270, 430312, G03F 7023
Patent
active
052643190
ABSTRACT:
Disclosed herein is a photosensitive resin composition composed mainly of an alkali-soluble organometallic polymer and a photosensitive dissolution inhibitor. The composition is used as a positive type resist which can be developed with an alkali developing solution. The resist has high sensitivity, high resolution, and resistance to oxygen plasma.
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Inoue Takashi
Mizushima Akiko
Nate Kazuo
Sugiyama Hisashi
Hitachi , Ltd.
Schilling Richard L.
Young Christopher G.
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