Photosensitive resin composition for sandblast resist

Details Photosensitive resin composition for sandblast resist Photosensitive resin composition for sandblast resist

1998-02-04

1999-07-20

Eley, Timothy V.

Abrading

Abrading process

Utilizing shield

4302841, B24B 100

Patent

active

059249129

ABSTRACT:
Disclosed is a photosensitive resin composition suitable as a resist material against sandblasting for pattern-wise engraving of the surface of a body after photolithographic patterning, which comprises: (a) a urethane compound having a (meth)acrylate group at the molecular end, which is obtained from a polyether or polyester compound having a hydroxy group at the molecular chain end, a diisocyanate compound and a (meth)acrylate compound having a hydroxy group; (b) an alkali-soluble polymeric compound having an acid value in the range from 50 to 250 mg KOH/g; and (c) a photopolymerization initiator.

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patent: 5102774 (1992-04-01), Settachayanon
patent: 5155143 (1992-10-01), Koleske

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