Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2006-09-05
2006-09-05
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S191000, C430S192000, C430S193000, C430S280100, C430S281100, C430S288100
Reexamination Certificate
active
07101650
ABSTRACT:
The present invention relates to a photosensitive resin composition for use as a photoresist, and more particularly, to a photosensitive resin composition for a photoresist comprising an acrylate copolymer obtained by selectively using specific compounds or controlling the ratio of unreacted monomers, and a 1,2-quinonediazide compound, which is excellent in several performance factors such as dielectric characteristics, flatness, transparency, developing performance, residual film rate, chemical resistance, and heat resistance, as well as sensitivity and resolution, and in particular it facilitates easy pattern formation into interlayer dielectrics, and it can be used as a photoresist in an LCD manufacturing process due to its excellent transmissivity even when prepared as a thick film.
REFERENCES:
patent: 5621019 (1997-04-01), Nakano et al.
patent: 5691111 (1997-11-01), Iwasa et al.
patent: 6004720 (1999-12-01), Takechi et al.
patent: 6399267 (2002-06-01), Nishimura et al.
patent: 2003/0193624 (2003-10-01), Kobayashi et al.
patent: 2005/0042536 (2005-02-01), Cho et al.
patent: 1 085 379 (2001-03-01), None
patent: 1 122 605 (2001-08-01), None
Cho Joon-Yeon
Kim Byung-Uk
Kwon Kyong-Il
Park Soo-Jung
Yoo Jae-Won
Chu John S.
Dongjin Semichem Co., Ltd.
Fish & Richardson P.C.
LandOfFree
Photosensitive resin composition for photoresist does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive resin composition for photoresist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive resin composition for photoresist will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3541537