Photosensitive resin composition for optical waveguide...

Optical waveguides – Having particular optical characteristic modifying chemical...

Reexamination Certificate

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C528S087000, C522S170000

Reexamination Certificate

active

07394965

ABSTRACT:
A radiation-sensitive resin composition for forming optical waveguides, which comprises (A) a novolac type epoxy resin and (B) a photo-acid generator. The composition is used as materials for a core portion5of an optical waveguide1, and the like. In the composition, component (A) is represented by the following general formula (1).(In the formula, R1is a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aralkyl group; and n is an integer from 0 to 10.) The composition is excellent in patterning properties and the like in curing process, and is also excellent in heat resistance, transmission characteristics, and long-term reliability after the optical waveguide has been formed.

REFERENCES:
patent: 8-271746 (1996-10-01), None
patent: 9-243870 (1997-09-01), None
patent: 2000-356720 (2000-12-01), None
patent: 2003-147045 (2003-05-01), None
patent: 2003147045 (2003-05-01), None
patent: 2003-177260 (2003-06-01), None
patent: 2003-195078 (2003-07-01), None
patent: 2003-202438 (2003-07-01), None

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