Photosensitive resin composition containing pullulan or esters t

Details Photosensitive resin composition containing pullulan or esters t Photosensitive resin composition containing pullulan or esters t

1974-11-05

1976-06-01

Turer, Richard B.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

96 351, 96 363, 2041601, 200 174R, 200 174G, 200 174C, 260209R, 260234R, 427 54, C08L 100, C08L 300

Patent

active

039606856

ABSTRACT:
A photosensitive resin composition comprising pullulan, which is a polymer having repetition units of maltotriose and is represented by the formula, ##SPC1##
Wherein n is an integer of 20 to 8,000, and/or a derivative thereof, a photopolymerizable monomer, a photosensitizer and a thermal polymerization inhibitor, or comprising the said pullulan, which has been incorporated with a photoactive reaction group to provide photosensitivity, and a photosensitizer, is a novel composition low in viscosity which can be prepared by use of water and can be formed into a photosensitive plate capable of being developed with water to give a clear image. Since the pullulan in said composition has no toxicity, the waste water formed at the time of development of said photosensitive plate can be treated with ease.

REFERENCES:
patent: 3696072 (1972-10-01), Reynolds et al.
patent: 3749699 (1973-07-01), Apellaniz
patent: 3801328 (1974-04-01), Takimoto et al.
patent: 3820993 (1974-06-01), Lewis et al.
patent: 3871892 (1975-03-01), Hijiya et al.

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