Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1980-06-10
1981-12-08
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430176, G03C 160, G03C 171
Patent
active
043048323
ABSTRACT:
The invention provides a novel photosensitive or photocurable resin composition suitable for the preparation of a planographic printing plate exhibiting excellent performance in development with an aqueous alkaline development solution as well as good ink-respectivity to form the image areas on the printing plate and high durability in printing . The resin composition comprises an acrylic copolymer and a diazo compound as the essential ingredients and the acrylic copolymer is composed of the recurring monomer units derived from alkyl esters of acrylic or methacrylic acid, from acrylonitrile or methacrylonitrile and from acrylic or methacrylic acid as the comonomers in limited proportions.
REFERENCES:
patent: 2826501 (1958-03-01), Hodgins
patent: 3113022 (1963-12-01), Cassiers
patent: 3840390 (1974-10-01), Mozu et al.
patent: 4123276 (1978-10-01), Kita
Kasukawa Shunichi
Ohta Katsuyuki
Otawa Shigeru
Brammer Jack P.
Tokyo Ohka Kogyo Kabushiki Kaisha
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