Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-04-10
2000-06-06
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
4302701, 4302831, 4302861, 4302871, G03F 7012
Patent
active
060716673
ABSTRACT:
A polyimide precursor having repeating units of the formula: wherein R.sup.1 is a tetravalent organic group; and R.sup.2 is a divalent diphenyl group, is excellent in image formation and particularly suitable for forming a pattern using an i-line stepper, and gives a photosensitive resin composition by imparting photosensitivity to the polyimide precursor, said photosensitive resin composition being suitable for forming surface protective films for semiconductor devices or interlaminar insulating films for multilayer wiring boards.
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Hagiwara Hideo
Kaji Makoto
Kikkawa Haruhiko
Kojima Mitsumasa
Kojima Yasunori
Chu John S.
Hitachi Chemical Co. Ltd.
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