Photosensitive resin composition and photosensitive resin lamina

Details Photosensitive resin composition and photosensitive resin lamina Photosensitive resin composition and photosensitive resin lamina

1996-10-25

1998-07-07

Berman, Susan W.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

522 18, 522 31, 522 32, 522 33, 522 88, 522 90, 522 95, 522 97, 522117, 522137, C08F 246, C08F 250, C08L 7516

Patent

active

057769958

ABSTRACT:
A photosensitive resin composition comprising the following components (A), (B) and (C): (A) a photopolymerizable urethane (meth)acrylate compound containing at least two acryloyl or methacryloyl groups, (B) an alkali-soluble polymer compound having an acid value of from 50 to 250 mgKOH/g, and (C) a photopolymerization initiator, wherein the photosensitive resin composition has an electrical insulation resistance of 8.0.times.10.sup.9 to 1.0.times.1.0.sup.14 .OMEGA..multidot.cm after photocuring. A photosensitive resin laminated film comprising a flexible film, a photosensitive layer provided on the flexible film, and a releasable film layer provided on the photosensitive layer, wherein the photosensitive layer comprises the above photosensitive resin composition.

REFERENCES:
patent: 4430416 (1984-02-01), Goto et al.
patent: 4587186 (1986-05-01), Nakamura et al.
patent: 4849321 (1989-07-01), Hung et al.
patent: 4855077 (1989-08-01), Shikinami et al.
patent: 5102774 (1992-04-01), Settachayanon
patent: 5155143 (1992-10-01), Koleske

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