Photosensitive resin composition and photosensitive element

Details Photosensitive resin composition and photosensitive element Photosensitive resin composition and photosensitive element

2006-07-19

2011-10-11

Chu, John (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

C430S165000, C430S193000

Reexamination Certificate

active

08034529

ABSTRACT:
A photosensitive resin composition comprising (a) a compound obtained by reacting a polybasic acid anhydride with the phenolic hydroxyl groups of a novolac-type phenol resin, and (b) a 1,2-quinonediazide compound. The photosensitive resin composition, which comprises component (b) composed of a 1,2-quinonediazide compound in combination with a component (a) obtained by reacting a polybasic acid anhydride with the phenolic hydroxyl groups of a novolac-type phenol resin, exhibits sufficiently high photosensitivity, image contrast, resolution and adhesiveness.

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