Photosensitive resin composition and method of manufacturing col

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430 7, 430145, 430197, 430270, 430294, 522 65, 522152, 5253273, 525376, 526273, G03C 524

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048206199

ABSTRACT:
A photosensitive resin composition contains a co-polymer of a glycidyl (meth)acrylate or glycidyl (.alpha.-methyl)vinyl ether with a (meth)acrylic amide or ester having a quaternary ammonium salt structure, and an aromatic azide as a photosensitizer. A color filter can be prepared by coating the composition on a substrate, and exposing and developing the coated composition to form a pattern. The resultant pattern is then dyed.

REFERENCES:
patent: 4299911 (1981-11-01), Ochi
patent: 4388397 (1983-06-01), Kanai
patent: 4401745 (1983-08-01), Nakane et al.
patent: 4588675 (1986-05-01), Nakane et al.
patent: 4590149 (1986-05-01), Nakane et al.
patent: 4608333 (1986-08-01), Ohbayashi et al.
patent: 4614701 (1986-09-01), Mori et al.
patent: 4614706 (1986-09-01), Matsuzawa et al.
Patent Abstracts of Japan, vol. 8, No. 1, Mar. 3, 1984, pp. 258 [1485] JP-A-58 199 342, Sekisui Kagaku Kogyo, K.K., 19-11-1983.
Patent Abstracts of Japan, vol. 9, No. 1, Jan. 5, 1985, pp. 258, [1725] JP-A-59 155 412, Matsushita Denki Sangyo K.K., 04-09-1984.
Chemical Abstracts, vol. 83, No. 10, Sep. 8, 1975, pp. 668, Abstract No. 88745u, Columbus, OH, U.S.: SU-A-454 526, Y. I. Kol'TSOV et al., 25-12-1974.
Chemical Abstracts, vol. 83, No. 24, Dec. 15, 1975, p. 482, Abstract No. 200252j, Columbus, OH, U.S., JP-A-75 72 702, Kuraray Co., Ltd. 16-06-1975.

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