Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1986-11-21
1989-04-11
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430 7, 430145, 430197, 430270, 430294, 522 65, 522152, 5253273, 525376, 526273, G03C 524
Patent
active
048206199
ABSTRACT:
A photosensitive resin composition contains a co-polymer of a glycidyl (meth)acrylate or glycidyl (.alpha.-methyl)vinyl ether with a (meth)acrylic amide or ester having a quaternary ammonium salt structure, and an aromatic azide as a photosensitizer. A color filter can be prepared by coating the composition on a substrate, and exposing and developing the coated composition to form a pattern. The resultant pattern is then dyed.
REFERENCES:
patent: 4299911 (1981-11-01), Ochi
patent: 4388397 (1983-06-01), Kanai
patent: 4401745 (1983-08-01), Nakane et al.
patent: 4588675 (1986-05-01), Nakane et al.
patent: 4590149 (1986-05-01), Nakane et al.
patent: 4608333 (1986-08-01), Ohbayashi et al.
patent: 4614701 (1986-09-01), Mori et al.
patent: 4614706 (1986-09-01), Matsuzawa et al.
Patent Abstracts of Japan, vol. 8, No. 1, Mar. 3, 1984, pp. 258 [1485] JP-A-58 199 342, Sekisui Kagaku Kogyo, K.K., 19-11-1983.
Patent Abstracts of Japan, vol. 9, No. 1, Jan. 5, 1985, pp. 258, [1725] JP-A-59 155 412, Matsushita Denki Sangyo K.K., 04-09-1984.
Chemical Abstracts, vol. 83, No. 10, Sep. 8, 1975, pp. 668, Abstract No. 88745u, Columbus, OH, U.S.: SU-A-454 526, Y. I. Kol'TSOV et al., 25-12-1974.
Chemical Abstracts, vol. 83, No. 24, Dec. 15, 1975, p. 482, Abstract No. 200252j, Columbus, OH, U.S., JP-A-75 72 702, Kuraray Co., Ltd. 16-06-1975.
Miyamura Masataka
Sanada Shinichi
Brammer Jack P.
Kabushiki Kaisha Toshiba
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