Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-10-28
1997-12-09
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, 430326, G03F 7023
Patent
active
056959060
ABSTRACT:
A photosensitive resin composition comprising an alkali-soluble resin, a quinonediazide-type photosensitive compound and a solvent, wherein the photosensitive compound comprises 1 a quinonediazide sulfonate of a novolak resin (A) of the following formula (i) having a weight average molecular weight of from 600 to 2,200 or a novolak resin (B) of the following formula (ii) having a weight average molecular weight of from 600 to 2,200, and 2 a quinonediazide sulfonate of a hydroxybenzophenone (C) of the following formula (iii): ##STR1## wherein each of R.sup.1 and R.sup.4 is an alkyl group, R.sup.2 is an alkyl group or an aryl group, R.sup.3 is a hydrogen atom or an alkyl group, each of u and v is an integer of from 0 to 3, provided that when each of R.sup.1 to R.sup.4 is present in a plurality, the plurality of each of R.sup.1 to R.sup.4 may be the same or different, and each of k and l is a number of at least 0, provided that k:l=1:9 to 10:0; ##STR2## wherein R.sup.5 is a hydroxyl group or a alkyl group, each of R.sup.6 and R.sup.9 is a hydrogen atom, an alkyl group or an aryl group, each of R.sup.7 and R.sup.10 is a hydrogen atom or an alkyl group, R.sup.8 is an alkyl group, x is an integer of from 0 to 2, y is an integer of from 0 to 3, provided that when each of R.sup.5 to R.sup.10 is present in a plurality, the plurality of each of R.sup.5 to R.sup.10 may be the same or different, and each of m and n is a number of at least 0, provided that m:n=10:0 to 6:4; ##STR3## wherein each of p and q is an integer of at least 0, provided that 3.ltoreq.p+q.ltoreq.6.
REFERENCES:
patent: 4555469 (1985-11-01), Erdmann et al.
patent: 4719167 (1988-01-01), Miura et al.
patent: 4859563 (1989-08-01), Miura et al.
patent: 5279918 (1994-01-01), Nishi et al.
patent: 5372909 (1994-12-01), Nishi et al.
Matsuo Iwao
Nakano Keisuke
Nakano Koji
Nishi Mineo
Chu John S.
Mitsubishi Chemical Corporation
LandOfFree
Photosensitive resin composition and method for forming a patter does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive resin composition and method for forming a patter, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive resin composition and method for forming a patter will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1606447