Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2008-03-25
2008-03-25
Chu, John S. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S191000, C430S192000, C430S193000, C430S326000, C430S330000
Reexamination Certificate
active
11511375
ABSTRACT:
A photosensitive resin composition comprising: a quinone diazide sulfonic acid ester of a phenol compound represented by formula (I) as defined in the specification; and a polybenzoxazole precursor, and a method for manufacturing a semiconductor device using the same
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patent: 2002-526795 (2002-08-01), None
Sato Kenichiro
Yamanaka Tsukasa
Chu John S.
FUJIFILM Corporation
Sughrue & Mion, PLLC
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