Photosensitive resin composition and manufacturing method of...

Details Photosensitive resin composition and manufacturing method of... Photosensitive resin composition and manufacturing method of...

2008-05-06

2008-05-06

Chu, John S. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

C430S192000, C430S193000, C430S326000, C430S330000

Reexamination Certificate

active

11655905

ABSTRACT:
A positive photosensitive resin composition, which contains a polybenzoxazole precursor, a quinonediazide photosensitizer and a carbonate solvent, and a method of manufacturing a semiconductor device using the composition.

REFERENCES:
patent: 6518390 (2003-02-01), Okanuma et al.
patent: 6780561 (2004-08-01), Ueda et al.
patent: 2007/0099111 (2007-05-01), Naiini et al.
patent: 2005-148111 (2005-06-01), None
patent: 2005-157327 (2005-06-01), None
patent: 2005-208527 (2005-08-01), None

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