Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Screen other than for cathode-ray tube
Reexamination Certificate
2006-03-10
2010-12-28
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Screen other than for cathode-ray tube
C430S190000, C430S191000, C430S192000, C430S193000
Reexamination Certificate
active
07858275
ABSTRACT:
A positive photosensitive resin composition with favorable heat resistance and transparency is provided. The photosensitive resin composition contains a resin component (A1) having a structural unit (a1′) obtained by substituting at least a portion of hydrogen atoms of phenolic hydroxyl groups within a structural unit represented by a general formula (a1) shown below with a naphthoquinone-1,2-diazide-5-(and/or -4-) sulfonyl group.(In the above general formula, R0represents a hydrogen atom or methyl group, R1represents a single bond or an alkylene group of 1 to 5 carbon atoms, R2represents an alkyl group of 1 to 5 carbon atoms, a represents an integer from 1 to 5, b represents either 0 or an integer from 1 to 4, and a+b is no greater than 5. If two or more R2groups exist, then these R2groups may be either the same or mutually different.)
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International Search Report from PCT/JP2006/304770 mailed on Jun. 13, 2006.
Office Action issued in counterpart Taiwanese Patent Application No. 095108623, dated Oct. 7, 2009.
Ohnishi Hiroyuki
Shida Masaru
Sugimoto Yasuaki
Tateno Isao
Chu John S
Knobbe Martens Olson & Bear LLP
Tokyo Ohka Kogyo Co. Ltd.
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