Photosensitive resin composition

Details Photosensitive resin composition Photosensitive resin composition

2007-08-09

2009-10-13

Berman, Susan W (Department: 1796)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

C522S039000, C522S040000, C522S041000, C522S042000, C522S043000, C522S044000, C522S046000, C522S053000, C522S079000, C522S080000, C522S121000, C430S281100

Reexamination Certificate

active

07601764

ABSTRACT:
The invention pertains to a photosensitive resin composition, comprising:(A) an alkaline soluble resin;(B) a multi-functional monomer;(C) a photoinitiator;(D) a colorant; and(E) a solvent,wherein said alkaline soluble resin comprises a copolymer obtained from the copolymerization of 5-95 wt % of the monomer of formula (1):and 5-95 wt % of an ethylenically unsaturated monomer containing at least one carboxy group.The inventive photosensitive resin composition possesses good heat resistance, development properties, and adhesion properties and can be used in liquid crystal displays as a photosensitive material for the manufacture of color filters.

REFERENCES:
patent: 7446159 (2008-11-01), Samukawa et al.
patent: 7553883 (2009-06-01), Yatake
patent: 2005/0148676 (2005-07-01), Doi et al.
patent: 2006/0261318 (2006-11-01), Morimoto et al.
patent: 2007/0043143 (2007-02-01), Sanai
patent: 2008/0227885 (2008-09-01), Sanai
patent: 2009/0175585 (2009-07-01), Makino et al.

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