Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From carboxylic acid or derivative thereof
Patent
1995-08-22
1997-09-16
Seidleck, James J.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From carboxylic acid or derivative thereof
528 26, 528170, 528171, 528172, 528173, 528174, 528179, 528183, 528185, 528220, 528229, 528335, 528336, 528341, 528342, 528345, 528351, 525420, 525436, C08G 7310, C08G 6926
Patent
active
056682484
ABSTRACT:
A photosensitive resin composition comprising, as its main ingredient, a poly(amic acid) resin constituted of a diamino compound represented by formula: ##STR1## and optionally used other diamino compound and a tetracarboxylic acid dianhydride as its constituent monomers and/or a poly(amic acid) ester resin obtained by esterifying said poly(amic acid) resin and/or a polyimide resin obtained by a dehydrating or alcohol-eliminating ring-closure reaction of said poly(amic acid) resin or poly(amic acid) ester resin has an excellent developability and a high film strength and can form a relief patter of low thermal expansion.
REFERENCES:
patent: 4645823 (1987-02-01), Ai et al.
patent: 4801681 (1989-01-01), Ahne
patent: 5310862 (1994-05-01), Nomura et al.
Hagiwara Hideo
Kaji Makoto
Kojima Yasunori
Nishizawa Hiroshi
Suzuki Kenji
Hampton-Hightower P.
Hitachi Chemical Co. Ltd.
Seidleck James J.
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