Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-04-25
1999-02-02
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430167, 430196, 430926, G03F 7012
Patent
active
058662960
ABSTRACT:
A photosensitive resin composition includes a polymer compound having a component of Formula (I) and a sensitizer having a cationic group in the molecule: ##STR1## (wherein X denotes a cationic species, and n is 0, 1 or 2.) The photosensitive resin composition is high in sensitivity, good in storage stability, and easy to produce, and is suitable for use in a screen printing plate, formation of black matrix or phosphor pattern of a color cathode-ray tube, a CCD or LCD color filter, a printing color proof, and various etching resists.
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Journal of Photopolymer--Science and Technology; vol. 8 1995, Japanese Patent Publication No. 565761 (1981).
Kikuchi Hideo
Miyazaki Mitsuharu
Shibuya Toru
Tochizawa Noriaki
Chu John S.
Toyo Gosei Co., Ltd.
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