Photosensitive resin composition

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

525 59, 525302, C08F27102

Patent

active

060204362

ABSTRACT:
A universal method to make photosensitive polymers from poly(vinyl alcohol) and poly(vinyl pyridine) is disclosed which generally does not require final purification. These polymers comprise a heterocyclic, light-sensitive pendant group including a moiety having the formula: ##STR1## wherein Z.sup.1 denotes the atoms necessary to form a substituted or unsubstituted aromatic heterocyclic ring; Z.sup.2 denotes the atoms necessary to form a substituted or unsubstituted aromatic or aromatic heterocyclic ring; R is hydrogen or a substituted or unsubstituted alkyl group; M is a divalent organic moiety; Y is a residue from a grafting group that is capable of grafting the pendant group onto a polymeric backbone.

REFERENCES:
patent: 2448542 (1948-09-01), McQueen et al.
patent: 2811510 (1957-10-01), Leubner et al.
patent: 3462274 (1969-08-01), Maeder et al.
patent: 3647442 (1972-03-01), Malster
patent: 3847615 (1974-11-01), Yoshida et al.
patent: 3892575 (1975-07-01), Watts et al.
patent: 3993486 (1976-11-01), Oishi
patent: 4009031 (1977-02-01), Carlson et al.
patent: 4038082 (1977-07-01), Yoshida et al.
patent: 4069050 (1978-01-01), Hara et al.
patent: 4127506 (1978-11-01), Gray et al.
patent: 4229522 (1980-10-01), Nakamura et al.
patent: 4245027 (1981-01-01), Takeda et al.
patent: 4278751 (1981-07-01), Specht et al.
patent: 4279721 (1981-07-01), Kirchmayr et al.
patent: 4284485 (1981-08-01), Berner
patent: 4288525 (1981-09-01), Shepherd et al.
patent: 4368253 (1983-01-01), Green et al.
patent: 4413138 (1983-11-01), Curtis
patent: 4449175 (1984-05-01), Curtis et al.
patent: 4449176 (1984-05-01), Curtis et al.
patent: 4459416 (1984-07-01), Curtis et al.
patent: 4517276 (1985-05-01), Lewis
patent: 4548890 (1985-10-01), Dickinson et al.
patent: 4564580 (1986-01-01), Ichimura et al.
patent: 4564581 (1986-01-01), Curtis et al.
patent: 4659649 (1987-04-01), Dickinson et al.
patent: 4677048 (1987-06-01), Lee et al.
patent: 4777114 (1988-10-01), Ichimura
patent: 4795692 (1989-01-01), Anderson et al.
patent: 4816386 (1989-03-01), Gotoh et al.
patent: 4900617 (1990-02-01), Smith
patent: 4917993 (1990-04-01), Mukonoki et al.
patent: 4992353 (1991-02-01), Rodakis et al.
patent: 5015416 (1991-05-01), Reid
patent: 5061603 (1991-10-01), Hamilton et al.
patent: 5073303 (1991-12-01), Reid
Borden et al., "Photopolymer Design: Photocrosslinkable Styrylpyridinium Substituted Vinyl Polymers with Absorption Maxima from 270 nm to 540 nm", Makromolekulare Chemi, vol. 178, pp. 3035-3049 (1977).
Borden et al., "Photosensitive Polymers", Chemical Abstracts, vol. 72, p. 10 (1970).
Borden et al., "Light-Sensitive Polymers", Radiation Chemistry and Photochemistry, vol. 72, p. 395 (1970). (Abstract).
Borden et al., "Light-Sensitive Polymers", Off. Gaz., 872(2), 357-358(1970).
Williams et al., "Cis and Trans Isomers of 2-styrylpyridine", The Journal of Organic Chemistry, vol. 26, pp. 4893-4895 (1961).
Williams, "Photodimerization of 2-styrylpyridine", The Journal of Organic Chemistry, vol. 25, No. 11, pp. 1839-1840 (1960).
Ichimura, "Preparation of Water-Soluble Photoresist Derived from Poly(vinyl Alcohol)", Journal of Polymer Science, vol. 20, 1411-1417 (1982).
Ichimura, "Preparation and Characteristics of Photocross-linkable Poly(vinyl Alcohol)", Journal of Polymer Science, vol. 20, 1419-1432 (1982).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photosensitive resin composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive resin composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive resin composition will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-938384

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.