Photosensitive resin composition

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From carboxylic acid or derivative thereof

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Details

528170, 528171, 528172, 528173, 528174, 528179, 528183, 528185, 528220, 528229, 528310, 528335, 528336, 528350, 525420, 525436, C08G 6926, C08G 7310

Patent

active

058470719

ABSTRACT:
A photosensitive resin composition comprising, as its main ingredient, a poly(amic acid) resin constituted of a diamino compound represented by formula: ##STR1## and optionally used other diamino compound and a tetracarboxylic acid dianhydride as its constituent monomers and/or a poly(amic acid) ester resin obtained by esterifying said poly(amic acid) resin and/or a polyimide resin obtained by a dehydrating or alcohol-eliminating ring-closure reaction of said poly(amic acid) resin or poly(amic acid) ester resin has an excellent developability and a high film strength and can form a relief patter of low thermal expansion.

REFERENCES:
patent: 5668248 (1997-09-01), Hagiwara et al.

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