Radiation imagery chemistry: process – composition – or product th – Holographic process – composition – or product – Composition or product or process of making the same
Patent
1997-03-11
1997-12-16
Angebranndt, Martin
Radiation imagery chemistry: process, composition, or product th
Holographic process, composition, or product
Composition or product or process of making the same
430 1, 4302211, 4302231, 4302301, 430290, 4302911, 430269, 359 1, 359 3, 552170, 552 25, 552 28, 552 27, 552 29, G03H 100, G03H 7004
Patent
active
056983450
ABSTRACT:
A photosensitive recording material comprising a solvent-soluble, thermosetting epoxy oligomer capable of cationic polymerization, an aliphatic monomer having at least one ethylenically unsaturated bond, the monomer being liquid at normal temperature and pressure, having a boiling point of 100.degree. C. or above at normal pressure and being capable of radical polymerization, a photoinitiator selected from the group consisting of i) a first photoinitiator capable of simultaneously generating a radical species that activates radical polymerization and a Br.o slashed.nsted acid or Lewis acid that activates cationic polymerization, upon exposure to actinic radiation, and ii) a second photoinitiator comprised of a radical polymerization photoinitiator capable of generating a radical species that activates radical polymerization upon exposure to actinic radiation and a cationic polymerization photoinitiator capable of generating a Br.o slashed.nsted acid or Lewis acid that activates cationic polymerization upon exposure to actinic radiation, and a spectral sensitizer that sensitizes the first photoinitiator or second photoinitiator; the aliphatic monomer being mixed in an amount of from 20 parts by weight to 80 parts by weight based on 100 parts by weight of the thermosetting epoxy oligomer. Use of this photosensitive recording material is effective for producing a volume type phase hologram having superior diffraction efficiency, transparency and weatherability such as thermal resistance and being chemically stable.
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Abstract of Database WPI, Section Ch, Week 9320 Derwent Publications Ltd., London, GB; & JP-A-05-094-014, Apr. 16, 1993.
Ito Hiromitsu
Ohe Yasushi
Shikano Miki
Toba Yasumasa
Yasuike Madoka
Angebranndt Martin
Toppan Printing Co. Ltd.
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