Photosensitive quinone diazide and resin composition having high

Details Photosensitive quinone diazide and resin composition having high Photosensitive quinone diazide and resin composition having high

1992-11-02

1994-05-24

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430512, G03F 7023, G03C 161

Patent

active

053147839

ABSTRACT:
A photosensitive resin composition comprising (A) an alkaline aqueous solution-soluble novolak resin, (B) a photosensitizer obtained by reacting a polyhydroxy compound with 1,2-naphthoquinone-(2)-diazido-5(or 4)-sulfonyl chloride, and (C) an ultraviolet absorber such as 2-(2'-hydroxy-5'-methylphenyl)-benzotriazole, has a strong absorption against a light of a wavelength of 365 nm and is suitable for producing semiconductor elements, etc.

REFERENCES:
patent: 4486518 (1984-12-01), Kesselman et al.
patent: 4847178 (1989-07-01), Komano
patent: 4871644 (1989-10-01), Bauer
patent: 5215858 (1993-06-01), Koibuchi et al.

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