Photosensitive positive diazo material with copolymer of acrylam

Details Photosensitive positive diazo material with copolymer of acrylam Photosensitive positive diazo material with copolymer of acrylam

1980-06-20

1981-10-20

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Diazo-type process, i.e., producing dye image by reacting...

430 5, 430150, 430157, 430176, 430292, 430294, 430295, 430326, G03C 160, G03C 171, G03C 174, G03C 534

Patent

active

042961939

ABSTRACT:
A photosensitive material and a process for developing the same are disclosed.
The photosensitive material is obtained by forming on a base material a layer of photosensitive composition comprising (A), 100 weight parts of a water soluble resin binder containing at least 60 weight % of acrylamide-diacetoneacrylamide copolymer, the copolymerization ratio of acrylamide and diacetoneacrylamide being 8:2-5:5 and average polymerization degree being 300-1500, and (B), 5-20 weight parts of a water soluble diazonium salt.
The photosensitive material is developed by using an aqueous alkali solution.

REFERENCES:
patent: 2687958 (1954-08-01), Neugebauer
patent: 2702242 (1955-02-01), Neugebauer et al.
patent: 3544317 (1970-12-01), Yonezawa
patent: 3756823 (1973-09-01), Ten Haaf et al.
patent: 3884703 (1975-05-01), Oba et al.
patent: 3900325 (1975-08-01), Christenson et al.
patent: 4086090 (1978-04-01), Kohashi et al.
patent: 4215191 (1980-07-01), Kwok

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