Photosensitive polymers as coating materials

Details Photosensitive polymers as coating materials Photosensitive polymers as coating materials

1984-05-10

1987-04-14

Martin, Roland E.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

430270, 430280, 430325, 522904, 522905, 522 35, 522164, G03C 516, G03C 171

Patent

active

046578323

ABSTRACT:
Coated material of a support, onto which is applied a radiation-sensitive coating of a homopolymer or copolymer with at least 5 mol %, based on the polymer, of structural units of the formula I ##STR1## in which R is a divalent aliphatic radical which can be interrupted by hetero-atoms or aromatic, heterocyclic or cycloaliphatic groups, a cycloaliphatic, heterocyclic or araliphatic radical, an aromatic radical in which two aryl nuclei are linked via an aliphatic group, or an aromatic radical which is substituted by at least one alkyl, cycloalkyl, alkoxy, alkoxyalkyl, alkylthio, alkylthioalkyl, hydroxyalkyl, hydroxyalkoxy, hydroxyalkylthio or aralkyl group or in which two adjacent C atoms of the aromatic radical are substituted by an alkylene group, R' independently has the same meaning as R and q is 0 or 1, and in which an aromatic radical R is not substituted by alkylene or by the abovementioned radicals if q is 0. The coating can be crosslinked directly by the effect of radiation. The material is suitable, for example, for the production of protective films and relief images.

REFERENCES:
patent: 3325450 (1967-06-01), Holub
patent: 3634304 (1972-01-01), Suzuki et al.
patent: 3666709 (1972-05-01), Suzuki et al.
patent: 3759913 (1973-09-01), Blackley
patent: 3926638 (1975-12-01), Rosen et al.
patent: 4331705 (1982-05-01), Samudrala
patent: 4451551 (1984-05-01), Kataoka et al.
patent: 4578166 (1986-03-01), Uno et al.

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