Photosensitive polymeric o-quinone diazide containing lithograph

Details Photosensitive polymeric o-quinone diazide containing lithograph Photosensitive polymeric o-quinone diazide containing lithograph

1977-04-21

1979-02-13

Bowers, Jr., Charles L.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 75, 96 86P, 96 91D, 96115R, 101456, G03F 708, G03C 154, G03C 170

Patent

active

041393848

ABSTRACT:
A photosensitive lithographic printing plate comprising a support having thereon a photosensitive layer composed of a photosensitive diazo-oxide resin containing a hydroxystyrene unit and a hydroxystyrene unit having an o-quinoediazide group bonded through the oxygen of the hydroxystyrene. The photosensitive layer can contain an alkali-soluble resin. The photosensitive lithographic printing plate is stable mechanically, provides a large difference in solubility between the exposed areas and the unexposed areas of the layer, and has improved printability and sensitivity.

REFERENCES:
patent: 3046120 (1962-07-01), Schmidt et al.
patent: 3046121 (1962-07-01), Schmidt
patent: 3046122 (1962-07-01), Sus
patent: 3046123 (1962-07-01), Sus et al.
patent: 3502470 (1970-03-01), Delzenne et al.
patent: 3551154 (1970-12-01), Di Blas et al.
patent: 3647443 (1972-03-01), Rauner et al.
patent: 3759711 (1973-09-01), Rauner et al.
patent: 3902906 (1975-09-01), Iwama et al.
Dinaburg, M., "Photosensitive Diazo Compounds", The Focal Press, 1964, pp. 182-191.

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