Photosensitive polymeric materials comprising poly-N-vinylphenox

Details Photosensitive polymeric materials comprising poly-N-vinylphenox Photosensitive polymeric materials comprising poly-N-vinylphenox

1975-01-31

1976-10-19

Welsh, John D.

Gas separation: apparatus

Magnetic separating means

252500, 252501, G03G 504

Patent

active

039868737

ABSTRACT:
A photosensitive polymeric material having photoelectric properties based on poly-N-vinylamines, which actually comprise poly-N-vinyldiphenylamine, its derivatives, and also copolymers of N-vinyldiphenylamine with N-vinylamines, poly-N-vinylphenothiazine and poly-N-vinylphenoxazine.
The polymers are applied onto an electroconductive substrate to give an electrophotographic material.
Said polymers are prepared by a method consisting in the interaction between secondary aromatic and heterocyclic amines or their mixtures with simple vinyl ethers in the presence of strong acids or with vinyl acetate in the presence of salts of mercury (II) or lead (IV), a strong acid and water.

REFERENCES:
patent: 3544318 (1970-12-01), Boothe et al.

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