Photosensitive polymeric material and electrophotometric materia

Details Photosensitive polymeric material and electrophotometric materia Photosensitive polymeric material and electrophotometric materia

1975-01-31

1978-06-13

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

96 15R, C08F 712, C08J 300

Patent

active

040950328

ABSTRACT:
A photosensitive polymeric material having photoelectric properties based on poly-N-vinylamines, which actually comprise poly-N-vinyldiphenylamine, its derivatives, and also copolymers of N-vinyldiphenylamine with N-vinylamines, poly-N-vinylphenothiazine and poly-N-vinylphenoxazine.
The polymers are applied onto an electroconductive substrate to give an electrophotographic material.
Said polymers are prepared by a method consisting in the interaction between secondary aromatic and heterocyclic amines or their mixtures with simple vinyl ethers in the presence of strong acids or with vinyl acetate in the presence of salts of mercury (II) or lead (IV), a strong acid and water.

REFERENCES:
patent: 2087079 (1937-07-01), Wolff
patent: 3272755 (1966-09-01), Shiraiff
patent: 3336279 (1967-08-01), Scott
patent: 3558581 (1971-01-01), Beerm ann
patent: 3642730 (1972-02-01), Amiard et al.
patent: 3705031 (1972-12-01), Kinjo et al.
patent: 3767393 (1973-10-01), Fox
Lopatinsky et al.-- Izvestia Tomskogo Politephnicheskogo Instituta, 111, 44, 1961.
Lopatinsky, et al. -- Izvestia Tomskogo Politephnicheskogo Instituta, 136, 30, 1965.

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