Photosensitive polymer and photosensitive material for photomech

Details Photosensitive polymer and photosensitive material for photomech Photosensitive polymer and photosensitive material for photomech

1981-12-31

1983-11-01

Levin, Stanford M.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

430195, C08F 830

Patent

active

044130910

ABSTRACT:
(1) A polyvinyl alcohol derivative represented by the formula: ##STR1## (where R.sub.1 is a hydrogen atom or an alkyl group, R.sub.2 is an aryl group, and k, l, m, and n denote integers of 1 or more.) (2) A photosensitive material for photomechanical process containing a polyvinyl alcohol derivative represented by the formula: ##STR2## (where R.sub.1 is a hydrogen atom or an alkyl group, R.sub.2 is an aryl group, and k, l, m, and n denote integers of 1 or more) and a sensitizing agent.

REFERENCES:
patent: 3072485 (1963-01-01), Reynolds et al.
patent: 3096311 (1963-07-01), Merrill et al.
G. A. Delzenne and U. Laridon, J. Polymer Sci., Part C, No. 22, pp. 1149-1160 (1969).
G. Nagamatsu et al., Bulletin of the Technical Association of Graphic Arts of Japan, Oversease No. 2, pp. 23-29 (1971).

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