Photosensitive polymer and chemically amplified photoresist...

Details Photosensitive polymer and chemically amplified photoresist... Photosensitive polymer and chemically amplified photoresist...

2006-08-01

2006-08-01

Ashton, Rosemary (Department: 1752)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S271000, C526S326000, C430S270100

Reexamination Certificate

active

07084227

ABSTRACT:
The photosensitive polymer includes a first monomer which is norbornene ester having C1to C12aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.

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