Photosensitive polyimide resin composition

Details Photosensitive polyimide resin composition Photosensitive polyimide resin composition

1995-09-12

1998-07-07

Hampton-Hightower, P.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From carboxylic acid or derivative thereof

528125, 528126, 528128, 528172, 528173, 528179, 528188, 528220, 528229, 528350, 524600, 524607, 430270, 430286, C08G 7310, C08G 6926

Patent

active

057770689

ABSTRACT:
Provided are photosensitive resin compositions comprising a polyamic compound having, at each terminal thereof, a specific actinic ray-sensitive functional group which has substituent groups each having a photopolymerizable carbon-carbon double bond, a photosensitive auxiliary having a photopolymerizable functional group and a solvent. The photosensitive resin compositions of the invention are excellent in resist properties such as sensitivity and good in storage stability and can provide a film small in residual stress.

REFERENCES:
patent: Re30186 (1980-01-01), Rubner et al.
patent: 3957512 (1976-05-01), Kleebert et al.
patent: 4040831 (1977-08-01), Rubner et al.
patent: 4243743 (1981-01-01), Hiramoto et al.
patent: 5238784 (1993-08-01), Tokoh et al.
patent: 5348835 (1994-09-01), Oba et al.
patent: 5518864 (1996-05-01), Oba et al.

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