Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate
Patent
1998-10-30
2000-12-12
Hampton-Hightower, P.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From phenol, phenol ether, or inorganic phenolate
528125, 528126, 528128, 528172, 528173, 528179, 528188, 528220, 528229, 528350, 528353, 528171, 528174, 524600, 524607, 430270, 430283, C08G 7310, C08G 6926
Patent
active
061600814
ABSTRACT:
The invention relates to a photosensitive polyimide resin composition comprising (A) a polyamic acid having, in its main chain, repeating units formed from a polycondensation product of at least one tetracarboxylic acid or tetracarboxylic anhydride thereof with at least one diamine compound, and having actinic ray-sensitive functional groups at both terminals thereof; (B) a photosensitive auxiliary having a photopolymerizable functional group; (C) a photopolymerization initiator; and (D) a solvent, wherein 1 the polyamic acid is such that when the repeating unit represented by the formula (1) is defined as a unit molecular weight, a unit molecular weight per carboxyl group (unit molecular weight/COOH) falls within a range of from 200 to 300, and 2 the photosensitive resin composition permits the formation of a polyimide film having a residual stress of 40 MPa or lower and a coefficient of thermal expansion of 30 ppm/.degree. C. or lower on a substrate, and to said polyamic acid, a polyimide film having excellent film properties, and a pattern forming process using the photosensitive polyimide resin composition.
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Kubota et al. J. Macromol. Sci.-Chem., A24(12):1407-1422 (1987) the month in the date of publication is not available.
Ito Ken-ichi
Naganuma Yasuo
Sakamoto Kei
Tanaka Akira
Yokouchi Kishio
Fujitsu Limited
Hampton-Hightower P.
Nippon Zeon Co. Ltd.
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