Photosensitive polyimide precursors

Details Photosensitive polyimide precursors Photosensitive polyimide precursors

1997-06-30

1999-02-02

Berman, Susan W.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

522 27, 522 28, 522164, 522149, 525420, 525421, 525928, 528313, 528315, 528316, 528353, 430194, 4302871, C08G 7312, G03F 7008

Patent

active

058666273

ABSTRACT:
New photosensitive polyamic acid precursors are disclosed which have the formula: ##STR1## where Z is a tetravalent organic radical which contains at least one aromatic ring, Z' is a divalent organic radical which contains at least one aromatic ring, and R* is a photo polymerizable group. Particularly preferred compounds include BPDA-PDA and BPDA-ODA polyamic acid precursors. The precursor compositions within the practice of this invention are i-line, g-line, and i-/g-line active and show good photoresolution. The films formed exhibit excellent self-adhesion and adhesion to glass ceramic and silicon wafer substrates have low internal stress, a very low degree of solvent swelling, high thermal stability, and excellent mechanical properties such as high modulus/tensile strength and high elongation at break.

REFERENCES:
patent: 4481340 (1984-11-01), Minnema et al.
patent: 5238784 (1993-08-01), Tokoh et al.
Katanka, F., Shoji, F., and Kojima, M., "Photosensitive Polyimide Precursors Using Azide Photosensitizers", Poly. Mater. Sci. Eng., vol. 66, 1992,pp. 239-240.

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