Photosensitive polyimide composition and polyimide precursor...

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

Reexamination Certificate

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C430S192000, C430S193000, C430S270100, C430S906000

Reexamination Certificate

active

07851121

ABSTRACT:
There is provided a photosensitive composition including a polyimide or polyimide precursor. The polyimide and polyimide precursor of the present invention includes a group of a first acid-cleavable group, a first base-cleavable group or a first thermally-cleavable group, and another group of a hydrophilic group, or a protected hydrophilic group by a second acid-cleavable group, a second base-cleavable group, or a crosslinkable group.

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patent: 6436593 (2002-08-01), Minegishi et al.
patent: 6600006 (2003-07-01), Jung et al.
patent: 6670090 (2003-12-01), Hsu et al.
patent: 6677099 (2004-01-01), Ishii et al.
International Search Report of PCT/US2006/604611, date of mailing Sep. 6, 2006.

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