Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From carboxylic acid or derivative thereof
Patent
1998-08-05
2000-02-15
Hampton-Hightower, P.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From carboxylic acid or derivative thereof
528 26, 528 38, 528125, 528128, 528171, 528172, 528173, 528174, 528183, 528188, 528220, 528229, 528350, C08G 7310
Patent
active
060254610
ABSTRACT:
A photosensitive polyimide, which comprises a copolymer of (A) three diamine compounds mixture consisting of a diaminopolysiloxane, a hydroxyl group-containing diamine or carboxyl group-containing diamine and 1,4-bis[2-(3-aminobenzoyl)ethenyl]benzene with (B) an aromatic tetrocarboxylic acid dianhydride or a dicarboxylic anhydride having a 2,5-dioxotetrahydrofuryl group as one acid anhydride group, is soluble in all-purpose low boiling organic solvents, typically methyl ethyl ketone and provides a negative type photosensitive polyimide, which is developable with an aqueous alkaline solution.
REFERENCES:
patent: 4861854 (1989-08-01), Sugio et al.
patent: 5177181 (1993-01-01), Rosenfeld et al.
patent: 5189115 (1993-02-01), Melquist
patent: 5300627 (1994-04-01), Kunimune et al.
patent: 5310862 (1994-05-01), Nomura et al.
patent: 5859181 (1999-01-01), Zhao et al.
patent: 5866627 (1999-02-01), Czornyj et al.
(SPIE vol. 1086, Advances in Resist Technology & Processing VI, pp. 396-405 (1989). The month in the date of publication is not available.
Chiang Lin-chiu
Lin Jeng-Tain
Hampton-Hightower P.
Nippon Mektron Limited
LandOfFree
Photosensitive polyimide does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive polyimide, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive polyimide will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1906906