Photosensitive polyamic acid derivative, compound used in manufa

Details Photosensitive polyamic acid derivative, compound used in manufa Photosensitive polyamic acid derivative, compound used in manufa

1983-01-24

1984-11-06

Kittle, John E.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

20415919, 430283, 430287, G03C 170, C08G 6948

Patent

active

044813406

ABSTRACT:
A photosensitive polyamic acid derivative obtained by treating polyamic acid with a compound of the formula (1), compound of formula (1), method of manufacturing a substrate having a polyimide layer by providing the substrate with a layer of the photosensitive polyamic acid derivative and then exposing, developing and imidizing the layer, as well as a semiconductor device comprising a polyimide layer obtained by using the above-mentioned method.

REFERENCES:
patent: 4107174 (1978-08-01), Baumann et al.
patent: 4243743 (1981-01-01), Hiramoto et al.
patent: 4331705 (1982-05-01), Samudrala

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