Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1978-12-05
1981-05-19
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430166, 430313, 430314, 430318, 430327, 430329, 430330, 430331, 20415923, G03C 154, G03C 160, G03C 170
Patent
active
042686024
ABSTRACT:
The present invention relates to a novel photosensitive composition. In particular, the present invention relates to a photosensitive resin composition suitable for use as a photoresist.
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Dinaburg, M. S., "Photosensitive Diazo Cpds", The Focal Press, 1964, pp. 191-196.
Ohbayashi Gentaro
Yoshino Tsuneo
Bowers Jr. Charles L.
Toray Industries, Ltd.
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