Photosensitive negative diazo composition with two acrylic polym

Details Photosensitive negative diazo composition with two acrylic polym Photosensitive negative diazo composition with two acrylic polym

1984-03-14

1985-09-03

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430160, 430175, 430176, 430302, G03C 160, G03F 708

Patent

active

045392854

ABSTRACT:
An improved resin coated substrate is prepared by coating a suitable substrate, such as aluminum with a composition comprising a salt having the structure A-N.sub.2.sup.+ X.sup.- wherein A is an aromatic or heterocyclic residue and X is an anion of an acid; and a binder composition comprising both an acrylic polymer and an acid containing acrylic copolymer.

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